Fabbrix Introduction
Below 65 nm, sub-wavelength lithography challenges and the corresponding process variability create new design challenges. Some of the challenges are familiar and can be handled by applying known techniques with additional rigor. But as process technologies approach fundamental physical limits, design and analysis flows increase in complexity and traditional methodologies fail.

An effective nanoscale design methodology must embrace the capabilities and limitations of the latest process technologies and at the same time meet the demands of a competitive marketplace.

Fabbrix delivers design solutions based on a regular-structures implementation of nanoscale process technologies. Based on over 10 years of advanced research, the Fabbrix approach results in higher yields, simpler design flows, less expensive masks, reduced transistor variation, more effective resolution enhancement and better use of your process technology.

Fabbrix offers a unique combination of physical building blocks, implementation and analysis tools and design methodologies that enable an improved IC design style. Fabbrix based designs are characterized by extreme regularity, predictability and simplicity and are precisely matched to the realities of nanoscale manufacturing.

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